Scalable Nanopatterning using Roll-based Jet and Flash Imprint Lithography

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Large area roll-to-roll manufacturing on flexible substrates is ubiquitous for applications such as paper and plastic processing. It combines the benefits of high speed and inexpensive substrates to deliver a commodity product at low cost. The challenge is to extend this approach to nanopatterning and realize similar benefits. To achieve low cost nanopatterning, it is imperative to move towards high speed imprinting, less complex tools, near zero waste of consumables and low cost substrates. The Jet and Flash Imprint Lithography (J-FILTM) process uses drop dispensing of UV curable resists to assist high resolution patterning for subsequent dry etch pattern transfer. The technology is actively being used to develop solutions for memory markets including Flash memory and patterned media for hard disk drives. We have applied J-FIL technology to a roll-based platform (LithoFlexTM 100), and have fabricated wire grid polarizers (WGPs) on both rigid and flexible substrates. In this paper we also address some of the key challenges for optimizing for roll based nanopatterning, which include process longevity, device scaling and device performance. By optimizing our patterning process, we have now produced large area wire grid polarizer devices with extinction ratios of 30,000 at 700nm.

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Journal: TechConnect Briefs
Volume: 1, Nanotechnology 2013: Advanced Materials, CNTs, Particles, Films and Composites (Volume 1)
Published: May 12, 2013
Pages: 777 - 780
Industry sector: Advanced Materials & Manufacturing
Topic: Advanced Manufacturing
ISBN: 978-1-4822-0581-7