Physical properties of multilayer thin films of Ti-V and their hydrides studied by ion beam analysis methods

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A wide variety of characterization techniques were used to determine the properties of titanium, titanium oxides and vanadium oxide thin film multilayers with different thicknesses, for the as-deposited state as well as under different levels of hydrogenation. Additionally, the same experiments and measurements have been performed for the same samples with surface partially covered by palladium. Firstly, the surface was observed by HRSEM and AES. The chemical composition was obtained by RBS and SIMS. Additionally, electrical resistivity was measured. In the next step, samples were charged with hydrogen under different hydrogen pressure, and the measurements were repeated after this process to observe the changes in film properties. Hydrogen profile in Ti-TiO2 system was also obtained by N-15 method. Reduction of vanadium oxides has been observed by RBS method.

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Journal: TechConnect Briefs
Volume: 1, Nanotechnology 2013: Advanced Materials, CNTs, Particles, Films and Composites (Volume 1)
Published: May 12, 2013
Pages: 124 - 127
Industry sector: Advanced Materials & Manufacturing
Topics: Materials Characterization & Imaging
ISBN: 978-1-4822-0581-7