Klingfus J., Sanabia J.E., Burcham K.E., Kahl M.
Raith USA, US
Keywords: electron beam lithography, grating, nanosieve, periodic structures, photonic crystal, stitching
A unique EBL writing technique is presented which is ideally suited to patterns of a periodic nature such as gratings, holograms, photonic crystals, sieves, etc. In contrast to classic step-and-write EBL strategies, this technique writes while the sample is in continuous movement, thus reducing classic “stitching” errors while also increasing throughput. Results of Bragg gratings written with this new patterning method will be discussed, as well further elaboration of the details regarding this new patterning strategy.
Journal: TechConnect Briefs
Volume: 2, Nanotechnology 2013: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational (Volume 2)
Published: May 12, 2013
Pages: 450 - 453
Industry sector: Advanced Materials & Manufacturing
Topics: Advanced Manufacturing, Nanoelectronics
ISBN: 978-1-4822-0584-8