van Eekelen J., Weixlberger J.
Suss MicroTec Lithography, DE
Keywords: large area imprint, NIL, non-UV based room temperature process
A new imprint technology for sub-50nm patterning will be introduced, bridging the gap between small rigid stamp application for best resolution and large area soft stamp usage with usual limited printing resolution below 200nm – SCIL Substrate Conformal Imprint Lithography is an enabling technology offering best of two worlds – large area soft stamps with repeatable sub-50nm printing capability, avoiding stamp deformation as no contact force applied, non-UV based curing at room temperature and allowing high aspect ratios even up to 1:10 The technology will be introduced, results for various applications be shown and measurement results confirming pattern fidelity and uniformity will be shown.
Journal: TechConnect Briefs
Volume: 1, Nanotechnology 2008: Materials, Fabrication, Particles, and Characterization – Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, Volume 1
Published: June 1, 2008
Pages: 556 - 558
Industry sector: Advanced Materials & Manufacturing
Topics: Advanced Manufacturing, Nanoelectronics
ISBN: 978-1-4200-8503-7