We have deposited metallic films (Au, Pt) on silicon substrates. The deposition technique was the Metal Plasma Immersion Ion Implantation and Deposition. Their roughnesses have been measured using a Scanning Tunneling Microscope. From these roughnesses, we determined the scaling critical exponents, a and b, which characterize the dynamics of the film growth process. The exponents, a and b, were determined following the procedure adopted in previous works. The relevant growth mechanisms are mainly desorption, nonlinear effects and surface diffusion effects. The competition between the desorption and diffusion terms generates, a characteristic length scale lx. For short length scale (l lx, the desorption and nonlinear terms are expected to be dominant. In these conditions, we expect that the Kardar-Parisi-Zhang (KPZ) would be obeyed. In this case the KPZ signature would be obeyed, that is, a + a/b = 2, as evidence for the validity of the KPZ equation. Long range spatial and temporal correlations effects in the noise function h2(x,t) are also being investigated.
Journal: TechConnect Briefs
Volume: 3, Technical Proceedings of the 2003 Nanotechnology Conference and Trade Show, Volume 3
Published: February 23, 2003
Pages: 223 - 226
Industry sector: Advanced Materials & Manufacturing
Topicss: Advanced Materials for Engineering Applications, Coatings, Surfaces & Membranes