Nanocharacterization Using Secondary Ion Mass Spectrometry (SIMS)

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Secondary Ion Mass Spectrometry (SIMS) has been widely applied for depth profile analysis in the semiconductor industry, but less widely applied to characterization of other materials. Evans East has developed techniques over the last few years to bombard samples with ultra-low energy beams (

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Journal: TechConnect Briefs
Volume: 2, Technical Proceedings of the 2005 NSTI Nanotechnology Conference and Trade Show, Volume 2
Published: May 8, 2005
Pages: 400 - 403
Industry sector: Advanced Materials & Manufacturing
Topics: Advanced Materials for Engineering Applications, Coatings, Surfaces & Membranes
ISBN: 0-9767985-1-4