Hu Q., Ghoniem N.M., Walgraef D.
University of California, Los Angeles, US
Keywords: adatom clusters, Multiscale modelling, thin film
We present here a novel multiscale modeling approach to investigate the conditions for atomic cluster self-organization on atomically flat substrates during epitaxy deposition processes. A phase field model is developed for the free energy of the system, which includes short-range chemical-type as well as long-range elastic-type interactions between deposited atoms and atom clusters. The effects of externally applied periodic strain fields through the substrate are investigated. At very low atomic coverage, a Kinetic Monte Carlo method is used to determine the nucleation conditions for atomic clusters forming on surfaces with periodic strain fields.
Journal: TechConnect Briefs
Volume: 2, Technical Proceedings of the 2005 NSTI Nanotechnology Conference and Trade Show, Volume 2
Published: May 8, 2005
Pages: 306 - 309
Industry sector: Advanced Materials & Manufacturing
Topics: Advanced Materials for Engineering Applications, Coatings, Surfaces & Membranes
ISBN: 0-9767985-1-4