Influence of resist composition on demolding force in UV nanoimprint lithography

Amirsadeghi A., Lee J., Park S.
Louisiana State University, US

Keywords: demolding force, nano imprint lithography, UV, Young's modulus

We investigated the influence of the Young’s Modulus (E) of UV resist on the measured demolding force in UV-NIL by varying compositions of UV-curable polymers. We found that decreasing crosslinking content of the polymers decreases the Young’s modulus and polymerization shrinkage and in turn the demolding force.

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Journal: TechConnect Briefs
Volume: 2, Nanotechnology 2010: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational
Published: June 21, 2010
Pages: 272 - 275
Industry sectors: Advanced Materials & Manufacturing | Sensors, MEMS, Electronics
Topic: MEMS & NEMS Devices, Modeling & Applications
ISBN: 978-1-4398-3402-2