Wilhelmi O., Roussel L, Anzalone P., Stokes D.J., Faber P., Reyntjens S.
FEI Company, NL
Keywords: DualBeam, FIB, nanopatterning, rapid prototyping
Modern FIB columns have not only reduced minimum spot sizes, but has also improved beam profiles at large and intermediate FIB currents. Focused ion beams with high beam currents and yet small spot sizes and narrow profiles are opening novel opportunities to expand FIB prototyping to larger areas of complex shapes. The better understanding of adequate strategies for FIB patterning has led to the development of new software for the conversion of complex CAD layouts into data streams optimized for FIB patterning and automated process control. We present the features of the new software which applies for the first time state-of-the-art FIB patterning intelligence to CAD layouts. Depth control of FIB milling through a library of material sputter rates, techniques avoiding redeposition artifacts and the optimized utilization of ion beam induced deposition and gas assisted etching are demonstrated in application examples. These examples will illustrate how new classes of nanotechnology applications can benefit from the direct process control and very short optimization cycles in rapid prototyping with DualBeam instruments.
Journal: TechConnect Briefs
Volume: 1, Nanotechnology 2009: Fabrication, Particles, Characterization, MEMS, Electronics and Photonics
Published: May 3, 2009
Pages: 24 - 27
Industry sector: Advanced Materials & Manufacturing
Topics: Advanced Manufacturing, Nanoelectronics
ISBN: 978-1-4398-1782-7