Development of new SAM coatings using a “sequential” vapor technique which can be deposited on almost any substrate material and withstand harsh environments is reported. Technical benefits for the improved surface modification method called Molecular Vapor Deposition (MVD) are discussed.
Journal: TechConnect Briefs
Volume: 2, Technical Proceedings of the 2005 NSTI Nanotechnology Conference and Trade Show, Volume 2
Published: May 8, 2005
Pages: 347 - 350
Industry sector: Advanced Materials & Manufacturing
Topicss: Advanced Materials for Engineering Applications, Coatings, Surfaces & Membranes