Development of a Resonant Magnetometer

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A new design and analysis of a resonant magnetometer is presented. Preliminary analysis shows a sensitivity of 3.9mV/microT. BESOI manufacturing techniques promises easy incorporation to present gyroscope and accelerometer designs promising a complete navigational control chip, which is the motivation to this project. This paper describes the design of a resonance based MEMS magnetometer that is manufactured using the Advanced Surface Etch (ASETM) process developed by Surface Technology Systems (STS) from Bonded etched silicon on insulator BESOI wafers. The design philosophy considers the ease of process, manufacturability, minimum number of steps and mask plates required for the development of the sensor.

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Journal: TechConnect Briefs
Volume: 1, Technical Proceedings of the 2003 Nanotechnology Conference and Trade Show, Volume 1
Published: February 23, 2003
Pages: 340 - 343
Industry sectors: Advanced Materials & Manufacturing | Sensors, MEMS, Electronics
Topic: MEMS & NEMS Devices, Modeling & Applications
ISBN: 0-9728422-0-9