Converting Dimensions: A Facile and High-Yield Route for Getting Sub-100 nm Silicon Nanowires


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For synthesizing uniform sub-100-nm Si nanowires (NWs), we introduce a metal-assisted chemical etching (MCE)-based facile and high-yield route, employing simple thermal annealing and vacuum deposition processes. Under rapid thermal annealing, an ultrathin Ag film on a Si substrate is self-organized into Ag nanoparticles, which are used for making Si nanoholes through a short MCE process. After the sputter deposition of Ag on the caved Si substrate with nanoholes, a Ag nanomesh is obtained. Finally, with the nanomesh as an etching mask, Si NWs are successfully produced through a second MCE process.

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Journal: TechConnect Briefs
Volume: 1, Nanotechnology 2014: Graphene, CNTs, Particles, Films & Composites
Published: June 15, 2014
Pages: 509 - 512
Industry sector: Advanced Materials & Manufacturing
Topic: Materials Characterization & Imaging
ISBN: 978-1-4822-5826-4