Application of focused ion beam technology for photonic nanostructures

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Al2O3 and KY(WO4)2 are promising materials for photonic applications with excellent optical properties and of interest for obtaining on chip resonator structures. However, there is no method available to fabricate these structures except FIB technology. We will discuss strategies to optimize the nano-structuring processes that are strongly dependent on the geometry of the desired structure. Furthermore, we will report our recent results on utilization and optimization of the focused ion beam technique for fabrication of nano-structures in integrated photonic devices on several material platforms such as amorphous Al2O3 and crystalline KY(WO4)2

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Journal: TechConnect Briefs
Volume: 2, Nanotechnology 2011: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational
Published: June 13, 2011
Pages: 200 - 203
Industry sector: Advanced Materials & Manufacturing
Topicss: Advanced Manufacturing, Nanoelectronics
ISBN: 978-1-4398-7139-3