Analysis of density variation for different temperatures in thermal nano imprinting process

Choi S-W; Lee D.E.; Lee H.J.; Lee W.I.

Analysis of density variation for different temperatures in thermal nano imprinting process

Lee D.E., Lee H.J., Lee W.I., Lee D.E., Lee H.J., Lee W.I., Choi S-W, Lee D.E., Lee H.J., Lee W.I.
Seoul National University, KR

Keywords: adhesion, Atomic force microscope, density variation, molecular dynamics simulation, nano imprint lithography

Density variation of the polymer resist for different temperatures in thermal nano imprinting1 process was studied by both experiments and molecular dynamics (MD) simulations. After patterning, we estimated the local density by measuring the pull-off force between a sharp tip and the patterned surface using an atomic force microscope (AFM) in liquid. In order to investigate the mechanism of density variation, we also performed molecular dynamics simulations.

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Journal: TechConnect Briefs
Volume: 1, Nanotechnology 2009: Fabrication, Particles, Characterization, MEMS, Electronics and Photonics
Published: May 3, 2009
Pages: 63 - 66
Industry sector: Advanced Materials & Manufacturing
Topics: Advanced Manufacturing, Nanoelectronics
ISBN: 978-1-4398-1782-7