Accelerated Neutral Atom Beam (ANAB) Technology for Nanoscale Surface Processing

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We use Accelerated Neutral Atom Beam (ANAB) technology to impart beneficial functionality on metal, ceramic, glass, and polymer surfaces without detrimental impacts of traditional plasma and ion beam technologies. ANAB provides an intense, collimated beam of energetic neutral gas atoms with highly controlled energies from 10- 100eV per atom, an ideal range for many nanoscale surface modifications. We demonstrate ANAB impact in three distinct areas. The first is atomic-level smoothing and amorphization of the topmost few nm of material surfaces, resulting in better transmissive and reflective properties in a variety of optical applications. The second area is for improved adhesion of coatings, increasing laser-induced damage threshold (LIDT) and providing benefits for drug delivery applications, among others. Finally, we demonstrate the use of ANAB for creation and modification of thin films and nano-membranes, with benefits to such diverse fields as EUV lithography, low-energy electron microscopy, and nano-filtration.

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Journal: TechConnect Briefs
Volume: TechConnect Briefs 2019
Published: June 17, 2019
Pages: 93 - 96
Industry sector: Advanced Materials & Manufacturing
Topics: Advanced Materials for Engineering Applications, Materials Characterization & Imaging
ISBN: 978-0-9988782-8-7