A novel method for realization of nickel silicide nanosheets with advanced morphology and photoemission

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Morphologically controlled nanostructures have been increasingly important, because of their highly shape dependent physical and chemical properties. Nickel-silicide nanomaterials, due to their wide range of applications, attracted strong attentions. There are some reports on fabrication and characterization of one and two-dimensional nickel silicide nanostructures but realization of 3D one is still a challenge. Here we report, for the first time, realization of novel highly crystallographic 3D nickel silicide nanosheets (NSs) with unique morphology and ultra-thin thickness based on plasma processing of Ni layer on Si substrate and post deep reactive ion etching (DRIE). The nickel-silicide NSs are realized through the orientated diffusion of nickel atoms between neighboring (111) planes via a novel stress-induced oriented-diffusion method. These ultra-thin NSs show unique optical properties of photo luminescence (PL) that would be ascribed to the enhanced direct band gap. The preferential adsorption of nickel silicide atoms along the (111)-type plane could be responsible for the formation of ultrathin NSs. The PL spectrum exhibited the broad peaks with maximum intensity around wavelengths of 339, 367, 440, 520 and 534nm.

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Journal: TechConnect Briefs
Volume: 1, Advanced Materials: TechConnect Briefs 2015
Published: June 14, 2015
Pages: 612 - 615
Industry sector: Advanced Materials & Manufacturing
Topics: Advanced Manufacturing, Environmental Health & Safety of Nanomaterials
ISBN: 978-1-4987-4727-1