Morphologically controlled nanostructures have been increasingly important, because of their highly shape dependent physical and chemical properties. Nickel-silicide nanomaterials, due to their wide range of applications, attracted strong attentions. There are some reports on fabrication and characterization of one and two-dimensional nickel silicide nanostructures but realization of 3D one is still a challenge. Here we report, for the first time, realization of novel highly crystallographic 3D nickel silicide nanosheets (NSs) with unique morphology and ultra-thin thickness based on plasma processing of Ni layer on Si substrate and post deep reactive ion etching (DRIE). The nickel-silicide NSs are realized through the orientated diffusion of nickel atoms between neighboring (111) planes via a novel stress-induced oriented-diffusion method. These ultra-thin NSs show unique optical properties of photo luminescence (PL) that would be ascribed to the enhanced direct band gap. The preferential adsorption of nickel silicide atoms along the (111)-type plane could be responsible for the formation of ultrathin NSs. The PL spectrum exhibited the broad peaks with maximum intensity around wavelengths of 339, 367, 440, 520 and 534nm.
Journal: TechConnect Briefs
Volume: 1, Advanced Materials: TechConnect Briefs 2015
Published: June 14, 2015
Pages: 612 - 615
Industry sector: Advanced Materials & Manufacturing
Topics: Advanced Manufacturing, Environmental Health & Safety of Nanomaterials