Van Schooneveld H.G., Litchy M.R., Grant D.G.
CT Associates, Inc, US
Keywords: Colloidal suspensions, CPM slurry, liquid filter retention
A new measurement technique has been developed that allows for measurement of particles as small as 5 nanometers in colloidal suspensions. The technique has demonstrated the ability to provide unique and useful particle size distribution (PSD) data for chemical/mechanical planarization (CMP) slurries used heavily in the micro-electronics industry. The ability to measure filter retention of particles in the 10-20 namometer size range has also been demonstrated.
Journal: TechConnect Briefs
Volume: 1, Nanotechnology 2011: Advanced Materials, CNTs, Particles, Films and Composites
Published: June 13, 2011
Pages: 41 - 44
Industry sector: Advanced Materials & Manufacturing
Topic: Materials Characterization & Imaging
ISBN: 978-1-4398-7142-3