step/flash nanoimprint lithography

UV-NIL with optimal droplets

Sirotkin V., Svintsov A., Zaitsev S., IMT RAS, RU

A homogeneous residual layer thickness in nanoimprint lithography (NIL) is a serious problem in step and flash (UV-)NIL. Improvement of thickness homogeneity could be expected from optimized size of droplets at resist dispensing in case [...]