lattice Monte Carlo – TechConnect Briefs

Atomistic Modeling of Arsenic Diffusion and Activation

Dunham S., Fastenko P., Qin Z., Henkelman G., University of Washington, US

Understanding the diffusion and activation of arsenic is critical for the formation of low resistance ultra-shallow junctions as required for nanoscale MOS devices. In this work, we combine the results of ab-initio calculations with continuum [...]

Linking of Atomistic Modeling to Macroscopic Behavior for Front End Processes

Dunham S.T., Boston University, US

In this work, we review efforts to make effective use of atomistic calculations for the advancement of VLSI process simulation. We focus on front-end processes such as defect mediated dopant diffusion which play a large [...]