Detection of diffused III-V materials in high-k oxides during atomic layer deposition and annealing
Cabrera W., Dong H., Brennan B., O’Connor É., Carolan P., Galatage R., Monaghan S., Povey I., Hurley P.K., Hinkle C.L., Chabal Y., Wallace R.M., University of Texas at Dallas, US
In this study we look at the impact of ALD HfO2 and Al2O3 on both InGaAs and InP substrates, with the aim of determining if there is any diffusion of substrate atoms into the high-k [...]