Step and Flash Imprint Lithography Using UV-transparent, Electrically Conductive Templates
Hooper A., Talin A.A., Dauksher W.J., Baker J.H., Convey D., Eschriech T., Resnick D.J., Bailey T.C., Johnson S., Willson C.G., Motorola Labs, US
Step and flash imprint lithography (SFIL) is a promising new technique capable of resolving sub 100nm features at a substantially lower cost than any other candidate method currently under development. Successful implementation of SFIL requires [...]