Three dimensional metal film catalyst assisted etching of silicon
Sheng W., Shi T., Sun B., Tan X., Jiang T., Liao G., Huazhong University of Science and Technology, CN
Recently metal assisted chemical etching of silicon has emerged as a promising low-cost technology for the fabrication of vertical aligned silicon nanowire arrays[1].The technology comprises two steps: depositing a layer of 2-D porous siliver film [...]