Responsive Hydrogels as Model Materials to Study the Deformation Behavior of Patterned Polymer Nanostructures
Tirumala V.R., Stafford C.M., Huang R., Lin E.K., Ocola L.E., National Institute of Standards and Technology, US
The mechanical stability of polymer nanolines is crucial to the success of semiconductor device fabrication. Recent experimental and modeling studies have focused on the influence of processing conditions on the stability of densely patterned lines. [...]