Flowability Modification of Fine Powders by Plasma Enhanced Chemical Vapor Deposition
Spillmann A., Sonnenfeld A., Rudolf von Rohr Ph., Swiss Federal Institute of Technology (ETH), Institute of Process Engineering, CH
Within the scope of this work a novel process to improve the flowability of fine powders is investigated. Nanoparticles are generated by plasma enhanced chemical vapor deposition (PECVD), and deposited on the surface of the [...]