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HomeAuthorsSonnenfeld A.

Authors: Sonnenfeld A.

Surface modification of powders and nanostructure deposition in the afterglow of a low power barrier discharge at atmospheric pressure

Sonnenfeld A., Reichen P., von Rohr Ph.R., ETH Zürich, CH
The precipitation of solid-state sphere-like nanostructures from an organosilicon precursor at atmospheric pressure is investigated in the prospect of the improvement of powder flowability by the attachment of nanoscopic spacers to the powder particles surfaces. [...]

Nanoscale Plasma Surface Modification of Powders

Roth C., Sonnenfeld A., von Rohr Ph.R., ETH Zürich, CH
New results of the plasma surface modification of fine-grained temperature sensitive particles are presented. Nanoparticles are deposited on larger substrate particles in a specially designed plasma chamber to improve the macroscopic powder properties as flowability [...]

Flowability Modification of Fine Powders by Plasma Enhanced Chemical Vapor Deposition

Spillmann A., Sonnenfeld A., Rudolf von Rohr Ph., Swiss Federal Institute of Technology (ETH), Institute of Process Engineering, CH
Within the scope of this work a novel process to improve the flowability of fine powders is investigated. Nanoparticles are generated by plasma enhanced chemical vapor deposition (PECVD), and deposited on the surface of the [...]

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