Process Aware Compact Model Parameter Extraction for 45 nm Process
Karmarkar A.P., Dasarapu V.K., Saha A.R., Braun G., Krishnamurthy S., Lin X-W, Synopsys (India) Pvt. Ltd., IN
The current industry trends call for smaller devices and decreasing feature sizes with each technology node. The process variability has a significant impact on the device characteristics for deep sub-micron technologies because of the smaller [...]