Micro Patterning Sensor Layers by Flame Deposition and Annealing
Tricoli A., Graf M., Mayer F., Kühne S., Hierlemann A., Pratsinis S.E., Swiss Federal Institute of Technology (ETH Zürich ), CH
A wafer-level, CMOS-compatible, dry process for in-situ synthesis, deposition and annealing of nanostructured, porous metal-oxide layers for gas sensors is presented. First, lace-like, nanostructured layers of pure or Pt-doped SnO2 featuring high porosity (98%) are [...]