Morris B.G. – TechConnect Briefs

Fabrication of a Real-Time Reactive Ion Etching Resonant Sensor Using a Low Temperature Sacrificial Polymer

Morris B.G., Joseph P.J., May G.S, Georgia Institute of Technology, US

This paper presents a sacrificial layer process using a low temperature polymer as a sacrificial material for fabricating a surface micromachined in-situ reactive ion etching (RIE) resonant sensor. The sensor monitors film thickness and etch [...]

Design and Development of an Integrated MEMS Sensor for Real Time Control of Plasma Etching

Morris B.G., May G.S, Georgia Institute of Technology, US

This paper explores a novel technique for monitoring film thickness in reactive ion etching that incorporates a micromachined sensor. The prototype sensor correlates film thickness with the change in resonant frequency that occurs in the [...]