Y-nano X-micro Technologies: nanometric optical control
de Lima Monteiro D.W., Honorato F.P., Ferreira Jr A.I., Soloviev O., Vdovin G., Loktev M., Federal University of Minas Gerais, BR
Nanometric control of optical quality is relevant in many different fields, ranging from Ophthalmology to Lithography, where ordinary setups suffer from optical aberrations. Most common aberrations feature amplitudes in the nanometer range and are often [...]