Electron Sources for Massively Parallel Electron Beam Lithography System using Single Vertically Aligned Carbon Nanofiber Cathodes
Guillorn M.A., Whealton J.H., Baylor L.R., Melechko A.V, Merkulov V.I., Hensley D.K., Hale M.D., Kasica R.J., Lowndes D.H., Simpson M.L., Oak Ridge National Laboratory, US
Electron beam lithography using a single beam cannot achieve acceptable throughput levels to become a viable manufacturing technology. The digital electrostatic e-beam array lithography (DEAL) concept under development at the Oak Ridge National Laboratory proposes [...]